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| MNE 2006 Entries ......................... MNE 2005 MNE
2005 Winners
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MNE
2006 micro & nano - graph Contest Entries Title: The Rose Description: Attempt to micro-mill a hole, 200 µm diameter, in black -poly(methylmethacrylate) (COC/Topas® with carbon particles). The milling speed was to high and the polymer melted. Magnification:
scale on the picture Submitted
by: Ramona Mateiu
Title: Black Moon Description: Hole milled in black-poly(methylmethacrylate) (i.e. COC/Topas® & carbon particles) with a 200 µm tool. Magnification:
scale on the picture
Title: Ice Age Description: Clusters of Fe2O3 nanoparticles micro-contact printed on poly-Si microelectrodes. Magnification:
scale on the picture Submitted
by: Ramona Mateiu
Description: Used micro-mill tool. The tool initial diameter was 200 µm. Magnification:
Scale on the picture Submitted
by: Ramona Mateiu
Description: Carbon nanotubes grown by electric field assisted chemical vapor deposition on poly-Si microelectrodes. Magnification:
scale on the picture Submitted
by: Ramona Mateiu
Description: A single multi-walled carbon nanotube suspended between gold microelectrodes. A voltage is applied between the middle microelectrode and the outer ones with the nanotube. The middle microelectrode is grounded and therefore appears darker in the micrograph. Magnification:
scale on the picture
Title: Spaghetti à la Nano Description: Gold microelectrodes approaching a single multi-walled carbon nanotube which extends in the open space from a bundle. Magnification:
scale on the picture Submitted
by: Ramona Mateiu
Title: PMMA Ruins Description: X-ray lithography of a 10 µm PMMA film, tilted under ± 45°. Remaining columns after 1st step of exposure are cut in pieces with 2nd exposure, those remain lying in order like an ancient stone wall. Magnification:
2000X
Title: German Ordered Collapse Description: X-ray lithography of a 5 µm PMMA film, 5625 columns with Ø 800 nm. While drying after wet development the columns are torn to each other due to capillary forces and stay in semi-ordered fields. Magnification:
740X
Title: Micro Viagra® Test Arrays Description: X-ray lithography of a 10 µm SU-8 film, fields of columns with different diameter and pitch. Patterns as indicators for the limit of stability. Magnification:
1700X
Title: The Spire Description: Electrochemical etching of a tungsten wire produces an extremely fine probe and a spire for pico-parishioners. Magnification:
33X
Title: Not an Escher Description: Accidental undercutting of square pits, during cryo etch in Si, resulting in a freestanding cage structure Magnification:
800 x Submitted
by: Chris Rétif
Title: Letters Description: Wet etched stamp for nanoimprint lithography. The letters are e-beam written into HSQ (Hydrogen Silsesquioxane) followed by development and a wet etch process with KOH. Magnification:
Scale on the picture
Title: The Dog Description: Wet etched stamp for nanoimprint lithography. The letters are e-beam written into HSQ (Hydrogen Silsesquioxane) followed by development and a wet etch process with KOH. Magnification:
Scale on the picture
Title: Who spilled the milk? Description:Optical image of quantum trees evolving from quantum dot solution by evaporation. Magnification:
Scale on the picture
Submitted by: Yongfeng Mei
Title: Who spilled the milk again? Description:Optical image of quantum trees evolving from quantum dot solution by evaporation. Magnification:
Scale on the picture
Submitted by: Yongfeng Mei
Title: It is 2006’s nano-Benz logo Description:AFM image of semiconductor nanochannel ( ~100 nm) network with Benz logo by releasing and bond-back of layers (REBOLA) technology. Magnification:
Scale on the picture
Submitted by: Yongfeng Mei
Title: Logos of MNE 2006 Olympic Games Description: Optical image of semiconductor nanochannel network by releasing and bond-back of layers (REBOLA) technology. Magnification:
Scale on the picture
Submitted by: Yongfeng Mei
Title: Satellite map of Nano World Description: Optical image of semiconductor nanochannel network by releasing and bond-back of layers (REBOLA) technology. Magnification:
Scale on the picture
Submitted by: Yongfeng Mei
Title: Who would like to fight with octopus army? Description: Optical image of semiconductor nanochannel network by releasing and bond-back of layers (REBOLA) technology. Magnification:
Scale on the picture
Submitted by: Yongfeng Mei
Title: Fringes Description:Detail of a deformed polymeric pattern, after NanoImprint lithography Magnification:
25 k X Submitted
by: Irene Fernández
Title: Giza Description:Overetched structures in a silicon wafer, after TMAH etching Magnification:
3.14 k X Submitted
by: Irene Fernández
Title: Spider Description:Deformed polymeric pattern, after NanoImprint lithography Magnification:
12.38 k X Submitted
by: Irene Fernández
Title: Surprise Description: Some remaining resist after cleaning a sample with acetone Magnification:
140 X Submitted
by: Irene Fernández
Title: Tulipes Description: Polymeric pattern, after NanoImprint lithography, with high imprinting and demolding temperature Magnification:
9.29 k X Submitted
by: Irene Fernández
Title: A piece of Nano- Mon Chéri Description: Porous Si after selective chemical treatment. Magnification:
100,000 Submitted
by: E. Horváth
Title: Snow Frost Description: 300 nm silicon balls on Si surface Magnification:
10,000 Submitted
by: E. Horváth
Title: Pt Ion Detection Description: Topo image of Pt ion adsorption (mesa-zone) and gold nanoparticles; mesa-zone is intaglio, however this zone is relievo in LFM image because of chemical properties. In addition, aggregated organic materials is not appeared in LFM image on the same reason. Instrument:
XE-100, PSIA (AFM)
Title: Nano Muffin Description: Porous Si after selective chemical treatment Magnification:
100,000 Submitted
by: E. Horváth
Title: Muffins Description: Optimization of technology for solder bumps. Magnification:
5.7 kX Submitted
by: Gemma Rius
Title: The Wave Description: Optical lithography on SU-8 resist after development. Magnification:
1.81 kX Submitted
by: Gemma Rius
Title: Little Worm Description: Amorphous carbon nanotube grown on a metal surface. Magnification:
398. kX Submitted
by: Gemma Rius
Title: Nano Worm Description: Cross-section of electrodeposited gold nanowires on Si substrate. Magnification:
70000x Submitted
by: Ran Ji
Title: Nano Crocodile Description: A part of Au nanowire fabricated by templated electrodeposition. Magnification:
306000x Submitted
by: Ran Ji
Title: Time Tunnel Description: Anisotropic electrochemical etched Si hole. Magnification:
10000x Submitted
by: Ran Ji
Title: Broccoli Description: Patterned Si substrate after electrochemical etching and cleaning. Magnification:
6500x Submitted
by: Ran Ji
Title: Nano Snake Description: Bowing of a gold nanowire. Magnification:
124000x Submitted
by: Ran Ji
Title: Black Spade Array Description: Nanowire array fabricated on SOI wafer by using interference lithography and isotropic HF etching. Magnification:
40000x Submitted
by: Ran Ji
Title: Silicon Paper Description: (110) Si structure after oxidation and Hf etching formed very thin Si nanofins. Magnification:
35000x Submitted
by: Ran Ji
Title: Honeycomb Description: Photoresist structure obtained by interference lithography. Magnification:
33000x Submitted
by: Ran Ji
Title: More than a Football Club Description: AFM topographic image of a local oxidation performed using AFM on a silicon wafer. Magnification:
Submitted
by: Cristina Martin Olmos |
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