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Richardson, Texas (May, 2003)
Zyvex Corporation today announced
the award of a eight-month SBIR program entitled, “Miniaturizing
Scanning Electron Microscope.”
The program’s objective is
to develop a low cost, high precision method for manufacturing
miniaturized e-beam columns, resulting in widespread applications
in imaging and lithography. Specifically, this manufacturing
technology will enable widespread applications of miniaturized
e-beam columns through inexpensive, parallel automated assembly.
The Zyvex team, under the leadership
of the Principal Investigator, Rahul Saini, will develop low-cost,
high-performance columns will make e-beam technology broadly
available to single- and multi-column users previously unable
to afford this technology.
“We are extremely proud
to receive this DARPA SBIR award,” said John Randall,
Ph.D., Chief Technology Officer at Zyvex. “The major
strength of our assembly strategy is the ability to incorporate
parallel assembly, dramatically reducing costs. This flexible
method further enables a variety of designs meeting the resolution,
scan area , and depth of focus needs of many
different applications.”
The current specialized SEM applications
will blossom into a much wider range of applications. Perhaps
the application most impacted in the long run will be
lithography, through the use of large
arrays of e-beam columns. The SEM applications market
needs to be willing to “think outside the
box” in order to take advantage of the wide
range of commercial applications made possible by the lower
cost and significantly reduced size of columns produced with
this technology. The DARPA award on mini-SEMS is just one
application of Zyvex’s micro- and nanoassembly technologies.
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